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Emerging Photonic and Electronic Materials Lab
FACILITIES
Material Synthesis/Deposition
Thermal CVD1
1. 2D material growth
2. Ga2O3 growth
Thermal CVD2
1. Ga2O3 growth
Atomic Layer Deposition System
1. Passivation layers (Al2O3)
2. SnO2 coating layer
Electric box furnace1
(1400 C)
Electric box furnace2
(900 C, ambient control)
Materials Characterizations
UV-Vis spectrometer
More characterization tools in the shared facility:
- Room temperature Hall measurement
- X-ray diffractometer
- Secondary electron microscopy
- Atomic force microscopy
- X-ray photoemission spectroscopy
- Transmission electron microscopy
- Raman spectroscopy
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